Chemical vapor deposition of palladium thin films from Lewis base adducts of Pd(hfac)(2) and of aluminum thin films from diethylamido alanes



Chemical vapor depositions, 1960-1980

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V3493D775
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January 17, 2003
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V3493 D761-793 P1-809
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TX 822-692 (1981)
Title:
Chemical vapor depositions, 1960-1980; a bibliography / By McDonald Robinson & Donald T. Hawkins. TX 822-692 (1981)
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Solution behavior of surfactants; theoretical & applied aspects, v. 2 & 4,873 other titles. (Part 015 of 033)

Chemical vapor deposition, 1960-1980: a bibliography

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V3505D860
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October 17, 2003
Entire Copyright Document:
V3505 D851-875 P1-801
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TX 822-692 (1981)
Title:
Chemical vapor deposition, 1960-1980: a bibliography / By McDonald Robinson & Donald T. Hawkins. TX 822-692 (1981)
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Solution behavior of surfactants: theoretical and applied aspects, vol. 2 & 4875 other titles. (Part 010 of 024)

The Modeling and dynamics of catalysts and fixed bed reactors

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Non-dramatic literary work
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TX0000736803 / 1981-08-04
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July 15, 1981
Date of Creation:
1980
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notice: 1980
Title:
The Modeling and dynamics of catalysts and fixed bed reactors / Klavs F. Jensen.
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Ann Arbor : University Microfilms International, 1981.
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Microfiche.
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Klavs Flemming Jensen
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Order no. 81-07030.
Names:
Klavs Flemming Jensen 1952-

Chemical vapor deposition of tantalum-carbide/titanium ...

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Non-dramatic literary work
Registration Number / Date:
TX0002386113 / 1988-08-24
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April 15, 1988
Date of Creation:
1987
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notice: 1987
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Chemical vapor deposition of tantalum-carbide/titanium ... / Glenn J. Sundberg.
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Ann Arbor : University Microfilms International, 1988.
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Glenn J. Sundberg
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Glenn J. Sundberg 1957-

Chemical vapor deposition, characterization, and device ...

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Non-dramatic literary work
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TX0002555276 / 1989-05-08
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December 14, 1988
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1988
Title:
Chemical vapor deposition, characterization, and device ... / Hua-shuang Kong.
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Ann Arbor : University Microfilms International, 1988.
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microfiche.
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Hua-shuang Kong
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Hua-shuang Kong 1951-

Chemical vapor deposition of titanium nitride coatings reinforced ...

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Non-dramatic literary work
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TX0003112987 / 1991-07-12
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March 15, 1991
Date of Creation:
1990
Title:
Chemical vapor deposition of titanium nitride coatings reinforced ... / Raj Narain Mathur.
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Ann Arbor : University Microfilms International, 1991.
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Raj Narain Mathur
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Raj Narain Mathur 1956-

Chemical vapor deposition of tungsten and tungsten silicides

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Non-dramatic literary work
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TX0003269876 / 1992-03-12
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November 14, 1991
Date of Creation:
1991
Title:
Chemical vapor deposition of tungsten and tungsten silicides : for VLSI/ULSI applications / by John E. J. Schmitz.
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Materials science and process technology series
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Materials science and process technology series
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John E. J. Schmitz
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John E. J. Schmitz

Chemical vapor deposition of early transition metal nitride thin films

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Non-dramatic literary work
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TX0003325062 / 1992-04-23
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November 15, 1991
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1991
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Chemical vapor deposition of early transition metal nitride thin films.
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Renaud Fix, 1962-
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Renaud Fix 1962-

Chemical vapor deposition of metal films by hydrogen atom reaction with metal compounds

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Non-dramatic literary work
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TX0003396389 / 1992-07-30
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February 14, 1992
Date of Creation:
1990
Title:
Chemical vapor deposition of metal films by hydrogen atom reaction with metal compounds.
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Hongwen Li, 1957-
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Hongwen Li 1957-

CVD-XII

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Non-dramatic literary work
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TX0003522883 / 1993-04-09
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March 22, 1993
Date of Creation:
1993
Title:
CVD-XII : Proceedings of the Twelfth International Symposium on Chemical Vapor Deposition, 1993 / edited by Klavs F. Jensen, G. W. Cullen.
Series:
High Temperature Materials, Dielectric Science and Technology, and Electronics Division proceedings ; vol. 93-2
Imprint:
Pennington, NJ : Electrochemical Society, c1993.
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440 p.
Other Title:
Proceedings of the Twelfth International Symposium on Chemical Vapor Deposition
High Temperature Materials, Dielectric Science and Technology, and Electronics Division proceedings ; vol. 93-2
Chemical vapor deposition
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Electrochemical Society, Inc. (employer for hire)
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Klavs F. Jensen
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Chemical vapor deposition

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TX0003705487 / 1993-12-22
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January 26, 1993
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1992
Title:
Chemical vapor deposition : principles and applications / edited by Michael L. Hitchman and Klavs F. Jensen.
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New Matter: text; additional ill., photos, figures, tables & graphs.
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San Diego : Academic Press, c1993.
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677 p.
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Chemical vapor deposition : principles and applications
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Klavs F. Jensen
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Chemical vapor deposition

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TX0003980813 / 1995-01-30
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January 25, 1995
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1995
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Chemical vapor deposition : thermal and plasma deposition of electronic materials / S. Sivaram.
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New York : Van Nostrand Reinhold, c1995.
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292 p.
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S. Sivaram
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Chemical vapor deposition of diamond in flames and fluidized beds

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Non-dramatic literary work
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TX0004294083 / 1996-05-24
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March 15, 1996
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1995
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Chemical vapor deposition of diamond in flames and fluidized beds.
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Ho Seon Shin
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Ho Seon Shin

Chemical vapor deposition of mullite coatings on silicon based ceramics for high temperature applications

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Non-dramatic literary work
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TX0004393985 / 1997-01-16
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August 30, 1996
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1996
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Chemical vapor deposition of mullite coatings on silicon based ceramics for high temperature applications.
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Rao Mulpuri
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Rao Mulpuri

Chemical vapor deposition of films in the boron and nitrogen system

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Non-dramatic literary work
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TX0004643236 / 1998-03-13
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October 2, 1997
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1997
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Chemical vapor deposition of films in the boron and nitrogen system.
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Katsuhito Yoshida
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Katsuhito Yoshida

Chemical vapor deposition

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Non-dramatic literary work
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TX0004816964 / 1998-08-05
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June 30, 1997
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1997
Title:
Chemical vapor deposition : proceedings of the Fourteenth international conference and EUROCVD-11 / editors, Mark D. Allendorf, Claude Bernard.
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Proceedings ; vol. 97-25
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Pennington, NJ : Electrochemical Society, c1997.
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1398 p.
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international conference and EUROCVD-11
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Chemical vapor deposition of palladium thin films from Lewis base adducts of Pd(hfac)(2) and of aluminum thin films from diethylamido alanes

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TX0004998596 / 1999-11-23
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Title:
Chemical vapor deposition of palladium thin films from Lewis base adducts of Pd(hfac)(2) and of aluminum thin films from diethylamido alanes.
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Chemical vapor deposition of palladium thin films from Lewis base adducts of Pd(hfac)(2) and of aluminum thin films fr
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Ligand field theory and its applications

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TX0005151454 / 2000-02-17
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December 14, 1999
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1998
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Ligand field theory and its applications / Brian N. Figgis, Michael A. Hitchman.
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New York : Wiley-Vch, c2000.
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354 p.
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Wiley-VCH, Inc.
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Chemical vapor deposition of metal oxide, titanium nitride and niobium nitride thin films

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TX0005163765 / 2000-10-13
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Chemical vapor deposition of metal oxide, titanium nitride and niobium nitride thin films.
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Xinye Liu
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Chemical vapor deposition of alumina-based thin films

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TX0005179655 / 2000-11-16
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August 15, 2000
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2000
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Chemical vapor deposition of alumina-based thin films.
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Bradley Dean Fahlman
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Chemical vapor deposition of silicon, silicon dioxide, titanium and ferroelectric thin films

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TX0005272458 / 2001-04-09
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January 30, 2001
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Title:
Chemical vapor deposition of silicon, silicon dioxide, titanium and ferroelectric thin films.
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Feng Chen
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Chemical vapor deposition

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TX0005515491 / 2001-08-03
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July 30, 2001
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2001
Title:
Chemical vapor deposition / edited by Jong-Hee Park, T. S. Sudarshan.
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C.O. correspondence.
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Surface engineering series ; vol. 2
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Materials Park, OH : ASM International, c2001.
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481 p.
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Surface engineering series ; vol. 2
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Jong-Hee Park
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Chemical vapor deposition XVI and EUROCVD 14

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Chemical vapor deposition XVI and EUROCVD 14 : vol. 1-2 : proceedings of the international symposium / editors, M. D. Allendorf, F. Maury, F.Teyssandier.
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Pennington, NJ : Electrochemical Society, c2003.
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Chemical vapor deposition XVI and EUROCVD 14 : vol. 1-2
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Chemical vapor deposition and atomic layer deposition of metal oxide and nitride thin films

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Non-dramatic literary work
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TX0005847325 / 2004-02-11
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Chemical vapor deposition and atomic layer deposition of metal oxide and nitride thin films.
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CVD XV

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TX0005857030 / 2004-01-20
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February 2, 2001
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2001
Title:
CVD XV : proceedings of the Fifteenth International Symposium on Chemical Vapor Deposition : proceedings vol. 2000-13 / editors, Mark D. Allendorf, Michael L. Hitchman.
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Pennington, NJ : Electrochemical Society, c2000.
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810 p.
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International Symposium on Chemical Vapor Deposition
Chemical vapor deposition XV
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Electrochemical Society, Inc. (employer for hire)
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Chemical vapor deposition and characterization of zinc oxide thin films and nanostructures

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Chemical vapor deposition and characterization of zinc oxide thin films and nanostructures.
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Xiang Liu
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Chemical vapor deposition of carbonaceous materials and metal oxides onto silicon and silicon carbide substrates

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TX0006280691 / 2006-05-15
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Chemical vapor deposition of carbonaceous materials and metal oxides onto silicon and silicon carbide substrates.
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